Updated worldwide glass market study 2019 available now for flat, container glass and tableware

We have updated our international studies on flat glass, container glass and tableware for 2019.

This unique software provides a global overview about glass producers and technical details. Easy to use and clear tables summarize information and data about glass makers such as: Glass types: flat glass, container glass, tableware, production capacities in regions and countries, number of furnaces, furnace types, year of construction, glass types and sub-types, products, project information, special news and downloads.

Further databases supplying demoscopic data and import and export data complete the market survey. Based on these data, prepare individual country profiles with information about local production capacities, local market sizes and expected demand in the future.

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Updated Hollow glass study 2019

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Updated Float glass study 2019

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Liste d´entreprises

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Contact

Adresse Beijing Xingxingyuan Materials Co., Ltd.
No. 10 Xingdingfuzhuang
Zhangjiawan, Tongzhou District
Beijing 101113
Pays République du Peuple Chine
E-mail Get in contact with Beijing Xingxingyuan Materials Co., Ltd.

Produits ou Machines

Beijing Xingxingyuan Materials Co.,Ltd supplies sputtering targets including rotary NiCr, NiV, Al, ZnSn, ZnAl, AZO, Si, Sn, Cr and planar NiCr, NiV, Cr, TiAl, Al, Si

  • Rotary NiCr (80/20wt%)sputtering targets,Purity99.9%,and max length 4 m.
  • Rotary NiV7 sputtering targets, purity 99.95% andmax length 4 m.
  • Rotary Al sputtering targets,purity 99.99%, and max length 4 m.
  • Rotary Sn sputtering targets,Purity 99.9% , max length 4m, and casted on SST backing tube.
  • Rotary ZnSn (50/50wt%or85/15wt%)sputtering targets,purity 99.9%,max length 4m,and casted on SST backing tube.
  • Rotary ZnAl (98/2wt%) sputtering targets,purity 99.9%, max length 4 m , casted on SST backing tube.
  • planar Cr sputtering target,HIPed, purity 99.9%.
  • planar NiCr (80/20wt%)sputtering targets,purity 99.9%.
  • planar NiV7 sputtering targetspurity 99.95%.
  • planar Si sputtering targets,B doped, purity 99.99%, bounded on backing plate.
  • planar TiAl (50/50at%)sputtering targets,Purity 99.8%, casted.
  • planar Al sputtering targets,purity 99.99%